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基本情報 |
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氏名 |
中村 修 |
氏名(カナ) |
ナカムラ オサム |
氏名(英語) |
Nakamura Osamu |
所属 |
機構 研究社会連携機構 研究社会連携センター |
職名 |
教授 |
researchmap研究者コード |
B000300963 |
researchmap機関 |
岡山理科大学 |
Magneto-Transport Properties in Near -Stoichiometric Hydride Films of YH2+δ under Weak Fields"
M.Sakai, T.Nanbo, O.Nakamura, Y.Uwatoko, H.Tajima
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We have investigated the basic characteristics of mobile carriers in as-deposited thin films of hexagonal-close-packed Y and hydrogenated films of face-centered-cubic YH2+δ. Hall resistance and transverse magnetoresistance measurements were carried out under magnetic fields of up to 1 T at room temperature. The Hall coefficient in YH2+δ showed a minimum value of ∼5×10−12 m3/C when the δ value reached ∼−0.1, in accordance with the δ dependence of resistivity reported previously. Quantitative analysis based on the present measurements revealed that YH2+δ is a compensated metal whose carrier density and mobility were determined to be ∼1.4×1027 (∼1.9×1027) m−3 and ∼3.5×10−3 (∼3.1×10−3) m2 V−1 s−1, respectively, for δ=0.04(−0.03) for both electrons and holes. These carrier parameters were found to account concurrently for the reflection spectral line shapes observed. The compensation observed in YH2+δ is at variance with a simple criterion used previously [E. Fawcett and W. A. Reed, Phys. Rev.131, 2463 (1963)].
Magneto-Transport Properties in Near -Stoichiometric Hydride Films of YH2+δ under Weak Fields
Journal of Applied Physics
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