論文

基本情報

氏名 中村 修
氏名(カナ) ナカムラ オサム
氏名(英語) Nakamura Osamu
所属 研究社会連携機構 研究社会連携センター
職名 教授
researchmap研究者コード B000300963
researchmap機関 岡山理科大学

題名

Dielectric function analysis of superstoichiometric samarium dihydride films

単著・共著の別

著者

M. Sakai, T.Nanbo,Y.Tanji, O.Nakamura, M.Endo, H.Tajima

概要

We have carried out an experimental study to reveal the dielectric function of SmHx(x=2.28,2.42,2.56,2.57) films based on room-temperature reflectivity for photon energies ranging from 0.05 to 6.5 eV. The derivation of the dielectric functions has been carried out using model dielectric functions as well as Kramers–Kronig analysis. It is inferred from our analysis that when the H/Sm value is increased from 2.28 to 2.57, (i) the interband transition band located in the ultraviolet region shows a redshift of about 1 eV, (ii) the relatively weak transition band located in the near-infrared region shows a reduction in intensity, and (iii) the unperturbed plasma frequency of free carriers decreases slightly. The behaviors (i), (ii), and (iii) caused by the H/Sm value change are thoroughly approximately the same as those observed for YHx, suggesting that these trends are characteristic of H–M systems showing a metal-insulator transition. It was also confirmed from our structural analysis that these changes in the dielectric function are achieved without a change in the lattice constant. The origin of this constancy in the lattice constant in our samples with different H/Sm values is discussed by assessing the T- and O-site hydrogen concentrations. The hydrogen incorporation effect is also observed in the magnitude of the unperturbed plasma frequency, about 1.7 eV, which is unexpectedly small compared to conventional metals. This characteristic can possibly be attributed to mass enhancement of mobile carriers; we obtained an effective mass of about 10m0 (where m0 is the free electron mass) when the carrier density estimated from the Hall coefficient value is used.

Dielectric function analysis of superstoichiometric samarium dihydride films

発表雑誌等の名称

Journal of Applied Physics

出版者

105

開始ページ

083512

終了ページ

発行又は発表の年月

2009/00

査読の有無

有り

招待の有無

無し

記述言語

英語

掲載種別

研究論文(学術雑誌)

ISSN

ID:DOI

ID:NAID(CiNiiのID)

ID:PMID

URL

JGlobalID

arXiv ID

ORCIDのPut Code

DBLP ID