Oxidation Resistance of Ti?Si?N and Ti?Al?Si?N Films Deposited by Reactive Sputtering Using Alloy Targets
Bibliography Type
Author
12. K. Takahashi, N. Oka, M. Yamaguchi, Y. Seino, K. Hattori, S. Nakamura, Y. Sato, and Y. Shigesato
Summary
Oxidation Resistance of Ti?Si?N and Ti?Al?Si?N Films Deposited by Reactive Sputtering Using Alloy Targets
12. K. Takahashi, N. Oka, M. Yamaguchi, Y. Seino, K. Hattori, S. Nakamura, Y. Sato, and Y. Shigesato