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| Basic information |
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| Name |
Nakatani Tatsuyuki |
| Belonging department |
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| Occupation name |
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| researchmap researcher code |
B000236977 |
| researchmap agency |
Okayama University of Science |
Influence of DC Substrate Bias Voltage on Deposition of Carbon Nanoparticles Produced by Ar+CH4 Multi-Hollow Discharge Plasma CVD method
Sung Hwa Hwang, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani, Jun Seok OH and Tatsuyuki Nakatani
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) / The 10th International Conference on Reactive Plasmas (ICRP-10)
Verbal presentations (general)
Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan
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