High rate reactive magnetron sputter deposition of Al-doped ZnO (AZO) with unipolar pulsing and impedance control system

Y. Nishi, K. Hirohata, N. Tsukamoto, Y. Sato, N. Oka, and Y. Shigesato

High rate reactive magnetron sputter deposition of Al-doped ZnO (AZO) with unipolar pulsing and impedance control system

Journal of Vacuum Science & Technology A

28

4

890

894