In-situ analyses on negative ions in the sputtering process to deposit Al-doped ZnO films

N. Tsukamoto, D. Watanabe, M. Saito, Y. Sato, N. Oka, and Y. Shigesato

In-situ analyses on negative ions in the sputtering process to deposit Al-doped ZnO films

Journal of Vacuum Science & Technology A

28

4

846

850